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INTEGRATED CIRCUIT ENGINEERING |
32 Macrocell PLD • Twin-well CMOS process in an N substrate (no epi). • Sub-micron gate lengths (0.35 micron N-channel and 0.4 micron P-channel). • Tungsten plugs used under all metal layers. 1These items present possible quality or reliability concerns. They shou |
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Desde 2024. D4U Semiconductor.
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