BI Technologies 898 Hoja de datos

No.	parte #	Fabricante	Descripción
1	898-3-R1.5K	BI Technologies	(898 / 899 Series) Dual-In-Line Thick Film Resistor Networks o c ∆R 0.70% ∆R 0.50% ∆R 0.25% ∆R 0.50% ∆R 0.25% ∆R 0.25% ∆R 0.25% ∆R 0.50% ∆R 1.00% ∆R 0.25% 200V rms for 1 minute 215°C for 3 minutes MIL-STD-202, Method 215 MIL-STD-202, Method 208 UL-94V-O Rated -55°C to +125°C 4-161 Models 898, 899 www.DataS
2	898-1-xxx	BI Technologies	(898 / 899 Series) Dual-In-Line Thick Film Resistor Networks o c ∆R 0.70% ∆R 0.50% ∆R 0.25% ∆R 0.50% ∆R 0.25% ∆R 0.25% ∆R 0.25% ∆R 0.50% ∆R 1.00% ∆R 0.25% 200V rms for 1 minute 215°C for 3 minutes MIL-STD-202, Method 215 MIL-STD-202, Method 208 UL-94V-O Rated -55°C to +125°C 4-161 Models 898, 899 www.DataS
3	898-3-xxx	BI Technologies	(898 / 899 Series) Dual-In-Line Thick Film Resistor Networks o c ∆R 0.70% ∆R 0.50% ∆R 0.25% ∆R 0.50% ∆R 0.25% ∆R 0.25% ∆R 0.25% ∆R 0.50% ∆R 1.00% ∆R 0.25% 200V rms for 1 minute 215°C for 3 minutes MIL-STD-202, Method 215 MIL-STD-202, Method 208 UL-94V-O Rated -55°C to +125°C 4-161 Models 898, 899 www.DataS
4	898-5-xxx	BI Technologies	(898 / 899 Series) Dual-In-Line Thick Film Resistor Networks o c ∆R 0.70% ∆R 0.50% ∆R 0.25% ∆R 0.50% ∆R 0.25% ∆R 0.25% ∆R 0.25% ∆R 0.50% ∆R 1.00% ∆R 0.25% 200V rms for 1 minute 215°C for 3 minutes MIL-STD-202, Method 215 MIL-STD-202, Method 208 UL-94V-O Rated -55°C to +125°C 4-161 Models 898, 899 www.DataS
5	898-3-R47KF	BI Technologies	(898-Series) Dual-In-Line Thick Film Resistor Networks jumper Speciﬁcations subject to change without notice. w 4-161 w w .D a S a t ∆R 0.70% ∆R 0.50% ∆R 0.25% ∆R 0.50% ∆R 0.25% ∆R 0.25% ∆R 0.25% ∆R 0.50% ∆R 1.00% ∆R 0.25% 200V rms for 1 minute 215°C for 3 minutes MIL-STD-202, Method 215 MIL-STD-
6	898-3-xxxx	BI Technologies	(898-Series) Dual-In-Line Thick Film Resistor Networks jumper Speciﬁcations subject to change without notice. w 4-161 w w .D a S a t ∆R 0.70% ∆R 0.50% ∆R 0.25% ∆R 0.50% ∆R 0.25% ∆R 0.25% ∆R 0.25% ∆R 0.50% ∆R 1.00% ∆R 0.25% 200V rms for 1 minute 215°C for 3 minutes MIL-STD-202, Method 215 MIL-STD-
7	898-1-xxxx	BI Technologies	(898-Series) Dual-In-Line Thick Film Resistor Networks jumper Speciﬁcations subject to change without notice. w 4-161 w w .D a S a t ∆R 0.70% ∆R 0.50% ∆R 0.25% ∆R 0.50% ∆R 0.25% ∆R 0.25% ∆R 0.25% ∆R 0.50% ∆R 1.00% ∆R 0.25% 200V rms for 1 minute 215°C for 3 minutes MIL-STD-202, Method 215 MIL-STD-
8	898-5-xxxx	BI Technologies	(898-Series) Dual-In-Line Thick Film Resistor Networks jumper Speciﬁcations subject to change without notice. w 4-161 w w .D a S a t ∆R 0.70% ∆R 0.50% ∆R 0.25% ∆R 0.50% ∆R 0.25% ∆R 0.25% ∆R 0.25% ∆R 0.50% ∆R 1.00% ∆R 0.25% 200V rms for 1 minute 215°C for 3 minutes MIL-STD-202, Method 215 MIL-STD-
9	898-3-R82	BI Technologies	(898 / 899 Series) Dual-In-Line Thick Film Resistor Networks o c ∆R 0.70% ∆R 0.50% ∆R 0.25% ∆R 0.50% ∆R 0.25% ∆R 0.25% ∆R 0.25% ∆R 0.50% ∆R 1.00% ∆R 0.25% 200V rms for 1 minute 215°C for 3 minutes MIL-STD-202, Method 215 MIL-STD-202, Method 208 UL-94V-O Rated -55°C to +125°C 4-161 Models 898, 899 www.DataS